Invention Grant
US09330804B2 Metallic material for electronic components, and connector terminals, connectors and electronic components using same
有权
用于电子元件的金属材料,以及使用其的连接器端子,连接器和电子部件
- Patent Title: Metallic material for electronic components, and connector terminals, connectors and electronic components using same
- Patent Title (中): 用于电子元件的金属材料,以及使用其的连接器端子,连接器和电子部件
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Application No.: US14387115Application Date: 2013-01-25
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Publication No.: US09330804B2Publication Date: 2016-05-03
- Inventor: Yoshitaka Shibuya , Kazuhiko Fukamachi , Atsushi Kodama
- Applicant: JX NIPPON MINING & METALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Drinker Biddle & Reath LLP
- Priority: JP2012-068148 20120323; JP2012-112634 20120516
- International Application: PCT/JP2013/051633 WO 20130125
- International Announcement: WO2013/140850 WO 20130926
- Main IPC: H01R13/03
- IPC: H01R13/03 ; H01B1/02 ; C23C14/14 ; C22C5/04 ; C22C5/06 ; C22C13/00 ; C22C19/03 ; C23C28/02 ; B32B15/01 ; H01R4/58 ; C23C10/28 ; C23C10/60 ; C23C14/58 ; H05K1/09 ; H05K3/24

Abstract:
The present invention provides a metallic material for electronic components having a low degree of whisker formation and a high durability, and connector terminals, connectors and electronic components using the metallic material. The metallic material for electronic components includes: a base material; on the base material, an lower layer constituted with one or two or more selected from the group consisting of Ni, Cr, Mn, Fe, Co and Cu; on the lower layer, an upper layer constituted with an alloy composed of one or both of Sn and In (constituent elements A) and one or two or more of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir (constituent elements B), wherein the thickness of the lower layer is 0.05 μm or more; the thickness of the upper layer is 0.005 μm or more and 0.6 μm or less; and in the upper layer, the relation between the ratio, the constituent elements A/(the constituent elements A+the constituent elements B) [mass %] (hereinafter, referred to as the proportion of Sn+In) and the plating thickness [μm] is given by plating thickness≦8.2×(proportion of Sn+In)−0.66 [herein, (the proportion of Sn+In)≧10 mass %].
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