Invention Grant
US09330927B2 System, method and apparatus for generating pressure pulses in small volume confined process reactor
有权
用于在小容量密闭过程反应器中产生压力脉冲的系统,方法和装置
- Patent Title: System, method and apparatus for generating pressure pulses in small volume confined process reactor
- Patent Title (中): 用于在小容量密闭过程反应器中产生压力脉冲的系统,方法和装置
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Application No.: US14012802Application Date: 2013-08-28
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Publication No.: US09330927B2Publication Date: 2016-05-03
- Inventor: Rajinder Dhindsa , Harmeet Singh , Sang Ki Nam
- Applicant: Lam Research Corporation
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01J37/32

Abstract:
A plasma processing system and method includes a processing chamber, and a plasma processing volume included therein. The plasma processing volume having a volume less than the processing chamber. The plasma processing volume being defined by a top electrode, a substrate support surface opposing the surface of the top electrode and a plasma confinement structure including at least one outlet port. A conductance control structure is movably disposed proximate to the at least one outlet port and capable of restricting an outlet flow through the at least one outlet port to a first flow rate and capable of increasing the outlet flow through the at least one outlet port to a second flow rate, wherein the conductance control structure restricts the outlet flow rate moves between the first flow rate and the second flow rate corresponding to a selected processing state set by the controller during a plasma process.
Public/Granted literature
- US20150064920A1 System, Method and Apparatus for Generating Pressure Pulses in Small Volume Confined Process Reactor Public/Granted day:2015-03-05
Information query
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