Invention Grant
- Patent Title: High speed bipolar junction transistor for high voltage applications
- Patent Title (中): 用于高压应用的高速双极结晶体管
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Application No.: US14195851Application Date: 2014-03-03
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Publication No.: US09331097B2Publication Date: 2016-05-03
- Inventor: Jin Cai , Tak H. Ning , Jeng-bang Yau
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Ido Tuchman; Louis J. Percello
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L27/06 ; H01L27/07

Abstract:
High speed bipolar junction transistor switches for high voltage operations. An example switch includes a bipolar junction transistor including a collector region positioned over a buried insulator region. The collector region includes dopants of a first conductivity type. A field effect transistor includes a source region also positioned over a buried insulator region. The source region electrically is coupled to the collector region such that all current passing the collector region enters the source region.
Public/Granted literature
- US20150249085A1 HIGH SPEED BIPOLAR JUNCTION TRANSISTOR FOR HIGH VOLTAGE APPLICATIONS Public/Granted day:2015-09-03
Information query
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