Invention Grant
- Patent Title: Method of manufacturing photoelectric conversion apparatus including pixel well contact
- Patent Title (中): 包括像素阱接触的光电转换装置的制造方法
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Application No.: US14532160Application Date: 2014-11-04
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Publication No.: US09331121B2Publication Date: 2016-05-03
- Inventor: Yusuke Onuki , Hiroaki Naruse , Masashi Kusukawa , Katsunori Hirota
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2013-242363 20131122
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L21/265

Abstract:
A method of manufacturing a photoelectric conversion apparatus which includes a pixel circuit section having a well where a photoelectric conversion element and an amplification element configured to generate a signal based on an amount of charge generated in the photoelectric conversion element are arranged, and a peripheral circuit section having a MOS transistor. The method includes forming a dielectric film for covering the photoelectric conversion element, the amplification element, and a gate electrode of the MOS transistor and forming, by etching the dielectric film, a side spacer by remaining a portion of the dielectric film on a side surface of the gate electrode while protecting by a resist, wherein an opening is formed in the dielectric film of the pixel circuit section with the etching, and a contact for defining a potential of the well is formed through the opening.
Public/Granted literature
- US20150147843A1 METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION APPARATUS Public/Granted day:2015-05-28
Information query
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