Invention Grant
US09331142B2 Zener diode having a polysilicon layer for improved reverse surge capability and decreased leakage current
有权
具有多晶硅层的齐纳二极管,用于改善反向浪涌能力和降低漏电流
- Patent Title: Zener diode having a polysilicon layer for improved reverse surge capability and decreased leakage current
- Patent Title (中): 具有多晶硅层的齐纳二极管,用于改善反向浪涌能力和降低漏电流
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Application No.: US14819826Application Date: 2015-08-06
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Publication No.: US09331142B2Publication Date: 2016-05-03
- Inventor: Shih-Kuan Chen , Wan-Lan Chiang , Ming-Tai Chiang , Chih-Ping Peng , Yih-Yin Lin
- Applicant: Vishay General Semiconductor LLC
- Applicant Address: US NY Hauppauge
- Assignee: VISHAY GENERAL SEMICONDUCTOR LLC
- Current Assignee: VISHAY GENERAL SEMICONDUCTOR LLC
- Current Assignee Address: US NY Hauppauge
- Agency: Mayer & Williams PC
- Agent Stuart H. Mayer
- Main IPC: H01L21/425
- IPC: H01L21/425 ; H01L29/06 ; H01L29/861 ; H01L29/66 ; H01L21/265 ; H01L21/283 ; H01L21/225 ; H01L29/866

Abstract:
A semiconductor device such as a Zener diode includes a first semiconductor material of a first conductivity type and a second semiconductor material of a second conductivity type in contact with the first semiconductor material to form a junction therebetween. A first oxide layer is disposed over a portion of the second semiconductor material such that a remaining portion of the second semiconductor material is exposed. A polysilicon layer is disposed on the exposed portion of the second semiconductor material and a portion of the first oxide layer. A first conductive layer is disposed on the polysilicon layer. A second conductive layer is disposed on a surface of the first semiconductor material opposing a surface of the first semiconductor material in contact with the second semiconductor material.
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