Invention Grant
- Patent Title: Nitride semiconductor Schottky diode and method for manufacturing same
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Application No.: US14682672Application Date: 2015-04-09
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Publication No.: US09331169B2Publication Date: 2016-05-03
- Inventor: Mayumi Morizuka
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-074275 20120328
- Main IPC: H01L21/28
- IPC: H01L21/28 ; H01L29/66 ; H01L29/872 ; H01L29/20 ; H01L21/285 ; H01L21/3065

Abstract:
According to an embodiment, a nitride semiconductor Schottky diode includes a first layer including a first nitride semiconductor and a second layer provided on the first layer and including a second nitride semiconductor having a wider band gap than the first nitride semiconductor. The diode also includes an ohmic electrode provided on the second layer and a Schottky electrode provided on the second layer. The second layer includes a region containing an acceptor in the vicinity of the Schottky electrode between the Schottky electrode and the ohmic electrode.
Public/Granted literature
- US20150214326A1 NITRIDE SEMICONDUCTOR SCHOTTKY DIODE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-07-30
Information query
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