Invention Grant
- Patent Title: Bipolar transistor
- Patent Title (中): 双极晶体管
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Application No.: US14821214Application Date: 2015-08-07
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Publication No.: US09331187B2Publication Date: 2016-05-03
- Inventor: Yasunari Umemoto , Atsushi Kurokawa , Tsunekazu Saimei
- Applicant: MURATA MANUFACTURING CO., LTD.
- Applicant Address: JP Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Kyoto-fu
- Agency: Studebaker & Brackett PC
- Priority: JP2013-028602 20130218
- Main IPC: H01L29/732
- IPC: H01L29/732 ; H01L31/072 ; H01L21/331 ; H01L29/737 ; H01L29/08 ; H01L29/15 ; H01L29/20

Abstract:
P-type second semiconductor layers each interposed between a corresponding pair of n-type first semiconductor layers reduce the apparent doping concentration in the entire collector layer without reducing the doping concentrations in the first semiconductor layers. This improves the linearity of capacitance characteristics and enables sufficient mass productivity to be achieved. Interposing each of the second semiconductor layers between the corresponding pair of the first semiconductor layers reduce the average carrier concentration over the entire collector layer, which allows a wide depletion layer to be formed inside the collector layer and, as a result, reduces base-collector capacitance.
Public/Granted literature
- US20150349100A1 BIPOLAR TRANSISTOR Public/Granted day:2015-12-03
Information query
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