Invention Grant
- Patent Title: VTFT with post, cap, and aligned gate
- Patent Title (中): VTFT与柱,盖和对齐门
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Application No.: US14198633Application Date: 2014-03-06
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Publication No.: US09331205B2Publication Date: 2016-05-03
- Inventor: Shelby Forrester Nelson , Carolyn Rae Ellinger
- Applicant: Eastman Kodak Company
- Applicant Address: US NY Rochester
- Assignee: EASTMAN KODAK COMPANY
- Current Assignee: EASTMAN KODAK COMPANY
- Current Assignee Address: US NY Rochester
- Agent William R. Zimmerli
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/423 ; H01L29/10

Abstract:
A thin film transistor includes a post on a substrate. The post has a height dimension extending away from the substrate to a top, and an edge along the height dimension. A cap covers the top of the post and extends to a distance beyond the edge of the post to define a reentrant profile. A conformal conductive gate layer is located on the edge of the post in the reentrant profile and not over the cap, and includes a portion that extends along the substrate. A conformal insulating layer is on the gate layer in the reentrant profile. A conformal semiconductor layer is on the insulating layer in the reentrant profile. First and second electrodes are located in contact with a first portion of the semiconductor layer over the cap and a second portion of the semiconductor layer not over the post, respectively.
Public/Granted literature
- US20150255623A1 VTFT WITH POST, CAP, AND ALIGNED GATE Public/Granted day:2015-09-10
Information query
IPC分类: