Invention Grant
- Patent Title: Nitride semiconductor light-emitting element and method for producing same
- Patent Title (中): 氮化物半导体发光元件及其制造方法
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Application No.: US14264771Application Date: 2014-04-29
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Publication No.: US09331245B2Publication Date: 2016-05-03
- Inventor: Mayuko Fudeta , Eiji Yamada
- Applicant: Sharp Kabushiki Kaisha
- Applicant Address: JP Osaka-Shi
- Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee: SHARP KABUSHIKI KAISHA
- Current Assignee Address: JP Osaka-Shi
- Agency: Morrison & Foerster LLP
- Priority: JP2010-034919 20100219
- Main IPC: H01L33/32
- IPC: H01L33/32 ; H01L33/12 ; H01L33/00 ; H01L33/20

Abstract:
Disclosed is a nitride semiconductor light-emitting element comprising a p-type nitride semiconductor layer 1, a p-type nitride semiconductor layer 2, and a p-type nitride semiconductor layer 3 placed in order above a nitride semiconductor active layer, wherein the p-type nitride semiconductor layer 1 and p-type nitride semiconductor layer 2 each contain A1, the average A1 composition of the p-type nitride semiconductor layer 1 is equivalent to the average A1 composition of the p-type nitride semiconductor layer 2, the p-type nitride semiconductor layer 3 has a smaller band gap than the p-type nitride semiconductor layer 2, the p-type impurity concentration of the p-type nitride semiconductor layer 2 and the p-type impurity concentration of the p-type nitride semiconductor layer 3 are both lower than the p-type impurity concentration of the p-type nitride semiconductor layer 1, and a method for producing same.
Public/Granted literature
- US20140231840A1 NITRIDE SEMICONDUCTOR LIGHT-EMITTING ELEMENT AND METHOD FOR PRODUCING SAME Public/Granted day:2014-08-21
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