Invention Grant
US09331265B2 Non-volatile memory with linear hot-electron injection technique and strain gauge using the same
有权
使用线性热电子注入技术的非易失性存储器和使用其的应变仪
- Patent Title: Non-volatile memory with linear hot-electron injection technique and strain gauge using the same
- Patent Title (中): 使用线性热电子注入技术的非易失性存储器和使用其的应变仪
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Application No.: US14380122Application Date: 2013-01-28
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Publication No.: US09331265B2Publication Date: 2016-05-03
- Inventor: Shantanu Chakrabartty
- Applicant: Board of Trustees of Michigan State University
- Applicant Address: US MI East Lansing
- Assignee: Board of Trustees of Michigan State University
- Current Assignee: Board of Trustees of Michigan State University
- Current Assignee Address: US MI East Lansing
- Agency: Harness, Dickey & Pierce, P.L.C.
- International Application: PCT/US2013/023407 WO 20130128
- International Announcement: WO2013/126181 WO 20130829
- Main IPC: G01L1/16
- IPC: G01L1/16 ; H01L41/113 ; G11C16/34 ; G11C27/00 ; G01B7/16 ; A61B5/00 ; H01L27/20 ; H01L29/788

Abstract:
A linear hot-electron injection technique is provided for a non-volatile memory arrangement. The non-volatile memory is comprised of: a floating gate transistor; a capacitor with a first terminal electrically coupled to the gate node of the floating gate transistor; a current reference circuit electrically coupled to the source node of the floating gate transistor; and a feedback circuit electrically coupled between the source node of the floating gate transistor and a second terminal of the capacitor. The feedback circuit operates to adjust a voltage at the gate node of the floating gate transistor in accordance with a source-to-drain voltage across the floating gate transistor.
Public/Granted literature
- US20150027237A1 NON-VOLATILE MEMORY WITH LINEAR HOT-ELECTRON INJECTION TECHNIQUE AND STRAIN GAUGE USING THE SAME Public/Granted day:2015-01-29
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