An external circular polisher with double polishing wheels includes: a first polishing wheel having a first internal circular surface; a second polishing wheel having a second internal circular surface; a plurality of holders mounted on the first internal circular surface and the second internal circular surface; a plurality of polishing units connected to the holders for polishing a target external circular surface; a driving unit for driving the first polishing wheel and the second polishing wheel; and a supporter for supporting the first polishing wheel and the second polishing wheel. With the foregoing structure, a user can polish a target with two polishing wheels at the same time, and the external circular polisher works stably; the present invention can be driven by a motor of a conventional device for further increasing a scope of application of the external circular polisher with double polishing wheels.