Invention Grant
- Patent Title: Method and device for cutting out hard-brittle substrate and protecting regions on the substrate
- Patent Title (中): 用于切割脆性基材和保护基材上的区域的方法和装置
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Application No.: US13874788Application Date: 2013-05-01
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Publication No.: US09333624B2Publication Date: 2016-05-10
- Inventor: Keiji Mase , Daisuke Chino , Masato Hinata
- Applicant: FUJI MANUFACTURING CO., LTD
- Applicant Address: JP Tokyo
- Assignee: FUJI MANUFACTURING CO., LTD
- Current Assignee: FUJI MANUFACTURING CO., LTD
- Current Assignee Address: JP Tokyo
- Agency: Cooper Legal Group LLC
- Priority: JP2012-107052 20120508; JP2012-193245 20120903
- Main IPC: B24C3/18
- IPC: B24C3/18 ; B24C3/32 ; B24C1/04

Abstract:
To cut out a hard-brittle substrate by blasting, laying out substrates 2 on a plate material 1 made of a hard-brittle material with leaving a space for blasting; forming first protective films 4 on both surfaces of the plate material 1 at layout positions of the substrates 2; and forming second protective films 5 on both surfaces of a margin 3 of the plate material 1 with leaving a space with respect to the first protective films 4 and having outer edges from a periphery of the plate material 1 at a width of 5 mm or less; cutting regions 6 between the films 4, 4 and between the films 4, 5 from one surface of the plate material 1 to a depth of approximately half of a thickness thereof by blasting, then cutting from the other surface of the plate material 1 until the plate material 1 is penetrated.
Public/Granted literature
- US20130303053A1 METHOD AND DEVICE FOR CUTTING OUT HARD-BRITTLE SUBSTRATE Public/Granted day:2013-11-14
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