Invention Grant
- Patent Title: Method for simultaneously cutting a multiplicity of wafers from a workpiece
- Patent Title (中): 从工件同时切割多个晶片的方法
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Application No.: US14493445Application Date: 2014-09-23
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Publication No.: US09333673B2Publication Date: 2016-05-10
- Inventor: Georg Pietsch
- Applicant: Siltronic AG
- Applicant Address: DE Munich
- Assignee: SILTRONIC AG
- Current Assignee: SILTRONIC AG
- Current Assignee Address: DE Munich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: DE102013219468 20130926
- Main IPC: B28D5/04
- IPC: B28D5/04 ; B23D57/00 ; B24B27/06

Abstract:
A method for simultaneously cutting a multiplicity of wafers from a cylindrical workpiece having an axis and a notch applied parallel to the axis in a lateral surface of the workpiece includes applying a cut-in beam on the workpiece where the cut-in beam has a head end and a foot end. The head end is inserted into the notch of the workpiece. The workpiece is held with a feed device so as to position an axis of the work piece parallel to the axes of cylindrical wire guide rollers of a wire saw. The cut-in beam is moved through a planar wire web, where the planar wire web has sections of wire arranged parallel to one another and perpendicular to the axes of the wire guide roller. The wire sections are moved the longitudinal wire direction in the presence of abrasives.
Public/Granted literature
- US20150083104A1 METHOD FOR SIMULTANEOUSLY CUTTING A MULTIPLICITY OF WAFERS FROM A WORKPIECE Public/Granted day:2015-03-26
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