Invention Grant
- Patent Title: Exposure device and exposure method
- Patent Title (中): 曝光装置和曝光方法
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Application No.: US12901887Application Date: 2010-10-11
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Publication No.: US09333708B2Publication Date: 2016-05-10
- Inventor: Shinsuke Haga , Masaki Ohno , Taichi Takeuchi
- Applicant: Shinsuke Haga , Masaki Ohno , Taichi Takeuchi
- Applicant Address: JP Tokyo
- Assignee: SONY CORPORATION
- Current Assignee: SONY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Hazuki International, LLC
- Priority: JP2009-241707 20091020
- Main IPC: G21G5/00
- IPC: G21G5/00 ; B29C67/00

Abstract:
An exposure device includes a rotation driving section that rotationally drives an exposure object; a light irradiation section that irradiates an exposure surface of the exposure object with laser light; a slide moving section secured to the rotation driving section or the light irradiation section, and moving the rotation driving section or the light irradiation section along the exposure surface in a direction crossing a direction of rotation of the rotation driving section; a signal generating section that transmits an analog modulating signal to the light irradiation section in accordance with a rotation synchronization signal from the rotation driving section, the analog modulating signal causing an intensity of the laser light to be changed; and a controlling section that controls movements of the rotation driving section, the slide moving section, and the light irradiation section.
Public/Granted literature
- US20110090477A1 EXPOSURE DEVICE AND EXPOSURE METHOD Public/Granted day:2011-04-21
Information query
IPC分类:
G | 物理 |
G21 | 核物理;核工程 |
G21G | 化学元素的转变;放射源 |
G21G5/00 | 通过化学反应进行化学元素的推断转变 |