Invention Grant
- Patent Title: Efficient oxidative coupling of methane processes and systems
- Patent Title (中): 甲烷过程和系统的有效氧化偶联
-
Application No.: US14789953Application Date: 2015-07-01
-
Publication No.: US09334204B1Publication Date: 2016-05-10
- Inventor: Guido Radaelli , Humera A. Rafique , Srinivas Vuddagiri , Erik C. Scher , Jarod McCormick , Joel Cizeron , Bipinkumar Patel , Satish Lakhapatri
- Applicant: Siluria Technologies, Inc.
- Applicant Address: US CA San Francisco
- Assignee: Siluria Technologies, Inc.
- Current Assignee: Siluria Technologies, Inc.
- Current Assignee Address: US CA San Francisco
- Agency: Wilson Sonsini Goodrich & Rosati
- Main IPC: C07C1/00
- IPC: C07C1/00 ; C07C27/00 ; C07C2/84 ; B01J19/24 ; C07C5/327 ; C07C1/04 ; C07C1/12 ; F01K27/02

Abstract:
The present disclosure provides oxidative coupling of methane (OCM) systems for small scale and world scale production of olefins. An OCM system may comprise an OCM subsystem that generates a product stream comprising C2+ compounds and non-C2+ impurities from methane and an oxidizing agent. At least one separations subsystem downstream of, and fluidically coupled to, the OCM subsystem can be used to separate the non-C2+ impurities from the C2+ compounds. A methanation subsystem downstream and fluidically coupled to the OCM subsystem can be used to react H2 with CO and/or CO2 in the non-C2+ impurities to generate methane, which can be recycled to the OCM subsystem. The OCM system can be integrated in a non-OCM system, such as a natural gas liquids system or an existing ethylene cracker.
Information query