Invention Grant
- Patent Title: Aromatic resins for underlayers
- Patent Title (中): 用于底层的芳香族树脂
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Application No.: US14701463Application Date: 2015-04-30
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Publication No.: US09334357B2Publication Date: 2016-05-10
- Inventor: Seon-Hwa Han , Sung Wook Cho , Hae-Kwang Pyun , Jung-June Lee , Shintaro Yamada
- Applicant: Rohm and Haas Electronic Materials LLC , Rohm and Haas Electronic Materials Korea Ltd.
- Applicant Address: US MA Marlborough KR
- Assignee: Rohm and Haas Electronic Materials LLC,Rohm and Haas Electronic Materials Korea Ltd.
- Current Assignee: Rohm and Haas Electronic Materials LLC,Rohm and Haas Electronic Materials Korea Ltd.
- Current Assignee Address: US MA Marlborough KR
- Agent S. Matthew Cairns
- Main IPC: C08G61/12
- IPC: C08G61/12 ; C09D165/00 ; G03F7/11 ; G03F7/09 ; G03F7/30 ; G03F7/36 ; G03F7/40
Abstract:
Polymeric reaction products of certain aromatic alcohols with certain diaryl-substituted aliphatic alcohols are useful as underlayers in semiconductor manufacturing processes.
Public/Granted literature
- US20150315333A1 AROMATIC RESINS FOR UNDERLAYERS Public/Granted day:2015-11-05
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