Invention Grant
- Patent Title: Wiring substrate and method of manufacturing wiring substrate
- Patent Title (中): 接线基板及制造布线基板的方法
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Application No.: US14583230Application Date: 2014-12-26
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Publication No.: US09334576B2Publication Date: 2016-05-10
- Inventor: Satoshi Miyazawa , Takahiro Rokugawa
- Applicant: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Applicant Address: JP Nagano
- Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
- Current Assignee Address: JP Nagano
- Agency: IPUSA, PLLC
- Priority: JP2014-033379 20140224
- Main IPC: H01L23/498
- IPC: H01L23/498 ; C25D5/02 ; C25D7/00 ; H05K3/40 ; H05K1/11 ; H05K3/34 ; H05K3/46

Abstract:
A wiring substrate includes a first metal layer formed on a wiring layer; a solder resist layer that covers the wiring layer and the first metal layer, and is provided with an open portion that exposes a part of an upper surface of the first metal layer; a second metal layer formed on the upper surface of the first metal layer that is exposed within the open portion; and a third metal layer formed on the second metal layer, wherein the solder resist layer covers an outer peripheral portion of the upper surface of the first metal layer to expose the part of the upper surface of the first metal layer within the open portion, and wherein an upper surface of the second metal layer is flush with an upper surface of the solder resist layer or projects from the upper surface of the solder resist layer.
Public/Granted literature
- US20150245478A1 WIRING SUBSTRATE AND METHOD OF MANUFACTURING WIRING SUBSTRATE Public/Granted day:2015-08-27
Information query
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