Invention Grant
- Patent Title: Residual pressure release valve
- Patent Title (中): 剩余压力释放阀
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Application No.: US14241510Application Date: 2012-09-04
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Publication No.: US09334975B2Publication Date: 2016-05-10
- Inventor: Masayuki Okitsu , Kazuhiro Matsushita
- Applicant: Masayuki Okitsu , Kazuhiro Matsushita
- Applicant Address: JP Tokyo
- Assignee: SMC KABUSHIKI KAISHA
- Current Assignee: SMC KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-195535 20110908
- International Application: PCT/JP2012/073007 WO 20120904
- International Announcement: WO2013/035877 WO 20130314
- Main IPC: F16K17/168
- IPC: F16K17/168 ; F16K31/528 ; F16K11/07

Abstract:
A flow-through condition of a pressure fluid between first through third ports formed in a body of a residual pressure release valve is switched by a valve plug of a valve mechanism. Between an operating unit for driving the valve mechanism and the body, a converter is disposed for converting rotational movement of the operating unit into linear movement and transferring the linear movement to the valve plug. The converter includes a cylindrical shaped cam ring including a pin inserted through the valve plug, and inclined grooves for guiding the pin. The cam ring includes two divided bodies separable from each other in a radial direction.
Public/Granted literature
- US20140224355A1 RESIDUAL PRESSURE RELEASE VALVE Public/Granted day:2014-08-14
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