Invention Grant
US09335276B2 Monitoring method and apparatus for control of excimer laser annealing 有权
准分子激光退火控制的监测方法和装置

Monitoring method and apparatus for control of excimer laser annealing
Abstract:
A method is disclosed evaluating a silicon layer crystallized by irradiation with pulses form an excimer-laser. The crystallization produces periodic features on the crystallized layer dependent on the number of and energy density ED in the pulses to which the layer has been exposed. An area of the layer is illuminated with light. A microscope image of the illuminated area is made from light diffracted from the illuminated are by the periodic features. The microscope image includes corresponding periodic features. The ED is determined from a measure of the contrast of the periodic features in the microscope image.
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