Invention Grant
- Patent Title: MEMS device with improved via support planarization
- Patent Title (中): 具有改进的通孔支撑平面化的MEMS器件
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Application No.: US14109529Application Date: 2013-12-17
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Publication No.: US09335540B2Publication Date: 2016-05-10
- Inventor: Lucius Marshall Sherwin , Jose Antonio Martinez , Ronald Charles Roth , Sean Christopher O'Brien
- Applicant: Texas Instruments Incorporated
- Applicant Address: US TX Dallas
- Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee: TEXAS INSTRUMENTS INCORPORATED
- Current Assignee Address: US TX Dallas
- Agent Michael A. Davis, Jr.; Frank D. Cimino
- Main IPC: G02B26/00
- IPC: G02B26/00 ; G02B26/08 ; G02F1/167

Abstract:
A microelectromechanical (MEMS) device has a movable member supported above a substrate on a via support. The member and via support are fabricated integrally from first and second member forming layers. A first member forming layer forms a lower part of the member and supporting structure for the via support. First and second fill layers are deposited and patterned to form a plug that fills an inner cavity opening in the via structure. The plug is planarized to a planar part of the first member forming layer, and a second member forming layer is deposited over the first member forming layer and the planarized plug to form an upper part of the member. The via support may have a cavity filled by BARC layers.
Public/Granted literature
- US20150103391A1 MEMS DEVICE WITH IMPROVED VIA SUPPORT PLANARIZATION Public/Granted day:2015-04-16
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