Invention Grant
US09335637B2 Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
有权
激光产生的等离子体EUV源，利用预定的非热激光消融减少碎片产生
- Patent Title: Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation
- Patent Title (中): 激光产生的等离子体EUV源，利用预定的非热激光消融减少碎片产生
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Application No.: US13227586Application Date: 2011-09-08
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Publication No.: US09335637B2Publication Date: 2016-05-10
- Inventor: Gildardo Delgado , Daniel Wack
- Applicant: Gildardo Delgado , Daniel Wack
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Suiter Swantz pc llo
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00
Abstract:
A method and apparatus for generating extreme ultraviolet (EUV) light is disclosed. The method may comprise non-thermally ablating a target material utilizing a first laser beam. The first laser beam may be configured for ejecting a portion of the target material in a non-thermal manner to create a plume. The method may further comprise irradiating the plume utilizing a second laser beam to produce a high-temperature plasma for EUV radiation.
Public/Granted literature
- US20130063803A1 LASER-PRODUCED PLASMA EUV SOURCE WITH REDUCED DEBRIS GENERATION Public/Granted day:2013-03-14
Information query
IPC分类:
