Invention Grant
US09336981B2 Charged particle detection system and multi-beamlet inspection system 有权
带电粒子检测系统和多子束检测系统

Charged particle detection system and multi-beamlet inspection system
Abstract:
A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.
Information query
Patent Agency Ranking
0/0