Invention Grant
- Patent Title: Charged particle detection system and multi-beamlet inspection system
- Patent Title (中): 带电粒子检测系统和多子束检测系统
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Application No.: US13639491Application Date: 2011-03-31
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Publication No.: US09336981B2Publication Date: 2016-05-10
- Inventor: Rainer Knippelmeyer
- Applicant: Rainer Knippelmeyer
- Applicant Address: IL Rehovot DE Jena
- Assignee: APPLIED MATERIALS ISRAEL LTD.,CARL ZEISS MICROSCOPY GMBH
- Current Assignee: APPLIED MATERIALS ISRAEL LTD.,CARL ZEISS MICROSCOPY GMBH
- Current Assignee Address: IL Rehovot DE Jena
- Agency: Morris & Kamlay LLP
- International Application: PCT/EP2011/001639 WO 20110331
- International Announcement: WO2011/124352 WO 20111013
- Main IPC: H01J37/09
- IPC: H01J37/09 ; H01J37/244

Abstract:
A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.
Public/Granted literature
- US20130032729A1 Charged Particle Detection System and Multi-Beamlet Inspection System Public/Granted day:2013-02-07
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