Invention Grant
- Patent Title: Chemical circulation system and methods of cleaning chemicals
- Patent Title (中): 化学循环系统和清洁化学品的方法
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Application No.: US14050014Application Date: 2013-10-09
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Publication No.: US09337055B2Publication Date: 2016-05-10
- Inventor: Chien-Hua Huang , Chung-Ju Lee
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L21/302
- IPC: H01L21/302 ; H01L21/461 ; H01L21/3213 ; H01L21/67 ; H01L21/311
Abstract:
A method includes passing a chemical solution through a metal-ion absorber, wherein metal ions in the metal-ion absorber are trapped by the metal-ion absorber. The chemical solution exiting out of the metal-ion absorber is then used to etch a metal-containing region, wherein the metal-containing region includes a metal that is of a same element type as the metal ions.
Public/Granted literature
- US20150099370A1 Chemical Circulation System and Methods of Cleaning Chemicals Public/Granted day:2015-04-09
Information query
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