Invention Grant
- Patent Title: Oxide semiconductor element and semiconductor device
- Patent Title (中): 氧化物半导体元件和半导体器件
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Application No.: US14575122Application Date: 2014-12-18
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Publication No.: US09337347B2Publication Date: 2016-05-10
- Inventor: Junichi Koezuka
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2011-009745 20110120
- Main IPC: H01L29/10
- IPC: H01L29/10 ; H01L29/76 ; H01L31/036 ; H01L31/112 ; H01L29/786 ; H01L29/66

Abstract:
A semiconductor element having high mobility, which includes an oxide semiconductor layer having crystallinity, is provided. The oxide semiconductor layer includes a stacked-layer structure of a first oxide semiconductor film and a second oxide semiconductor film having a wider band gap than the first oxide semiconductor film, which is in contact with the first oxide semiconductor film. Thus, a channel region is formed in part of the first oxide semiconductor film (that is, in an oxide semiconductor film having a smaller band gap) which is in the vicinity of an interface with the second oxide semiconductor film. Further, dangling bonds in the first oxide semiconductor film and the second oxide semiconductor film are bonded to each other at the interface therebetween. Accordingly, a decrease in mobility resulting from an electron trap or the like due to dangling bonds can be reduced in the channel region.
Public/Granted literature
- US20150102347A1 OXIDE SEMICONDUCTOR ELEMENT AND SEMICONDUCTOR DEVICE Public/Granted day:2015-04-16
Information query
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