Invention Grant
US09337367B2 Multiple-junction photoelectric device and its production process 有权
多结光电器件及其生产工艺

Multiple-junction photoelectric device and its production process
Abstract:
A multiple-junction photoelectric device includes sequentially, a substrate, a first conducting layer, at least two elementary photoelectric devices, at least one of the elementary photoelectric devices being made of microcrystalline silicon, and a second conducting layer. The first conducting layer has a surface facing the microcrystalline silicon elementary photoelectric device such that the surface: has a lateral feature size bigger than 100 nm, and a root-element-square roughness bigger than 40 nm, includes inclined elementary surfaces such that α50 is greater than 20°, where α50 is the angle for which 50% of the elementary surfaces of the surface of the first conducting layer have an inclination equal to or less than this angle, and includes valleys formed between two elementary surfaces and having a radius of curvature smaller than 100 nm.
Public/Granted literature
Information query
Patent Agency Ranking
0/0