Invention Grant
- Patent Title: Seed used for crystalline silicon ingot casting
- Patent Title (中): 种子用于结晶硅锭铸造
-
Application No.: US14139641Application Date: 2013-12-23
-
Publication No.: US09337375B2Publication Date: 2016-05-10
- Inventor: Hung-Sheng Chou , Yu-Tsung Chiang , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Sung-Lin Hsu , I-Ching Li , Chung-Wen Lan , Wen-Ching Hsu
- Applicant: Sino-American Silicon Products Inc.
- Applicant Address: TW Hsinchu
- Assignee: Sino-American Silicon Products Inc.
- Current Assignee: Sino-American Silicon Products Inc.
- Current Assignee Address: TW Hsinchu
- Agency: Christensen Fonder P.A.
- Priority: TW101150738A 20121228
- Main IPC: H01L31/18
- IPC: H01L31/18

Abstract:
The invention discloses a seed used for crystalline silicon ingot casting. A seed according to a preferred embodiment of the invention includes a crystal and an impurity diffusion-resistant layer. The crystal is constituted by at least one grain. The impurity diffusion-resistant layer is formed to overlay an outer surface of the crystal. A crystalline silicon ingot fabricated by use of the seed of the invention has significantly reduced red zone and yellow zone.
Public/Granted literature
- US20140186631A1 SEED USED FOR CRYSTALLINE SILICON INGOT CASTING Public/Granted day:2014-07-03
Information query
IPC分类: