Invention Grant
US09338887B2 Core substrate, manufacturing method thereof, and structure for metal via
有权
核心基板,其制造方法和金属通孔的结构
- Patent Title: Core substrate, manufacturing method thereof, and structure for metal via
- Patent Title (中): 核心基板,其制造方法和金属通孔的结构
-
Application No.: US14022813Application Date: 2013-09-10
-
Publication No.: US09338887B2Publication Date: 2016-05-10
- Inventor: Jae Hoon Choi , Jong Kuk Hong
- Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Suwon-si
- Agency: NSIP Law
- Priority: KR10-2012-0114669 20121016
- Main IPC: H05K1/11
- IPC: H05K1/11 ; H05K3/44 ; H05K1/02 ; H05K3/00 ; H05K3/40

Abstract:
The present invention relates to a core substrate, a manufacturing method thereof, and a structure for a metal via. In accordance with an embodiment of the present invention, a core substrate including: an insulation layer; a plurality of metal vias passing through the insulation layer and formed to become wider from upper and lower surfaces to a middle part of the insulation layer; and a conductive layer formed on the upper and lower surfaces of the insulation layer and connected to the plurality of metal vias. Further, a manufacturing method thereof and a structure for a metal via are provided.
Public/Granted literature
- US20140102770A1 CORE SUBSTRATE, MANUFACTURING METHOD THEREOF, AND STRUCTURE FOR METAL VIA Public/Granted day:2014-04-17
Information query