Invention Grant
- Patent Title: Non-volatile semiconductor device
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Application No.: US14607612Application Date: 2015-01-28
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Publication No.: US09349464B2Publication Date: 2016-05-24
- Inventor: Hidehiro Shiga , Masanobu Shirakawa
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JP2012-179445 20120813
- Main IPC: G11C16/04
- IPC: G11C16/04 ; G11C16/14 ; G11C16/34 ; G11C16/08 ; H01L27/115

Abstract:
A non-volatile semiconductor device includes first and second selecting transistors; multiple memory cells that are stacked above the substrate; multiple word lines that are connected to control gates of the multiple memory cells; selecting gate lines that are each connected to a gate of one of the selecting transistors; a bit line connected to the first selecting transistor; a source line connected to the second selecting transistor; and a control circuit configured to execute an erasing loop that includes an erase operation and a verifying operation. The control circuit increases an erasing voltage in accordance with the number of times the erasing loop is repeated.
Public/Granted literature
- US20150138883A1 NON-VOLATILE SEMICONDUCTOR DEVICE Public/Granted day:2015-05-21
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