Invention Grant
US09349771B2 Microlens forming method and solid-state image sensor manufacturing method
有权
微透镜成型方法和固态图像传感器的制造方法
- Patent Title: Microlens forming method and solid-state image sensor manufacturing method
- Patent Title (中): 微透镜成型方法和固态图像传感器的制造方法
-
Application No.: US14591467Application Date: 2015-01-07
-
Publication No.: US09349771B2Publication Date: 2016-05-24
- Inventor: Mitsuhiro Yomori , Masaki Kurihara , Yasuhiro Sekine
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA
- Current Assignee: CANON KABUSHIKI KAISHA
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2014-012765 20140127; JP2014-234005 20141118
- Main IPC: H01L27/146
- IPC: H01L27/146 ; G02B3/00
Abstract:
A microlens forming method, comprising etching a first member and a second member arranged on the first member, the second member including a concavo-convex shape, and forming a microlens from the first member, wherein, the etching of the first and the second members is performed under a condition that an etching rate of the first member is higher than that of the second member, a portion of the first member under the concave portion is exposed during the etching of the second member, and the exposed portion of the first member is removed in the etching of the first member.
Public/Granted literature
- US20150214270A1 MICROLENS FORMING METHOD AND SOLID-STATE IMAGE SENSOR MANUFACTURING METHOD Public/Granted day:2015-07-30
Information query
IPC分类:
