Invention Grant
US09349795B2 Semiconductor switching device with different local threshold voltage
有权
具有不同局部阈值电压的半导体开关器件
- Patent Title: Semiconductor switching device with different local threshold voltage
- Patent Title (中): 具有不同局部阈值电压的半导体开关器件
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Application No.: US14310011Application Date: 2014-06-20
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Publication No.: US09349795B2Publication Date: 2016-05-24
- Inventor: Christian Fachmann , Enrique Vecino Vazquez
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/739 ; H01L29/417 ; H01L29/423 ; H01L29/10 ; H01L21/283 ; H01L21/22 ; H01L27/06 ; H01L21/8249 ; H01L29/78

Abstract:
A semiconductor device includes a semiconductor substrate having a plurality of switchable cells defining an active area of the semiconductor device, an outer rim, and an edge termination region arranged between the switchable cells and the outer rim. Each of the switchable cells includes a body region, a gate electrode structure and a source region. A source metallization is in ohmic contact with the source regions of the switchable cells. A a gate metallization is in ohmic contact with the gate electrode structures of the switchable cells. The active area defined by the switchable cells includes at least a first switchable region having a first threshold and at least a second switchable region having a second threshold which is higher than the first threshold. An area assumed by the first switchable region is larger than an area assumed by the second switchable region.
Public/Granted literature
- US20150372086A1 Semiconductor Switching Device with Different Local Threshold Voltage Public/Granted day:2015-12-24
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