Invention Grant
- Patent Title: Fluid treatment using plasma technology
- Patent Title (中): 使用等离子体技术的流体处理
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Application No.: US14640432Application Date: 2015-03-06
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Publication No.: US09352984B2Publication Date: 2016-05-31
- Inventor: Christopher A. Campbell , Young I. Cho , Alexander F. Gutsol , Alexander Fridman , Frank T. Snyder , Vincent Szarko , Erik Yelk , Jesse Zanolini , Victor N. Vasilets
- Applicant: DREXEL UNIVERSITY
- Applicant Address: US PA Philadelphia
- Assignee: Drexel University
- Current Assignee: Drexel University
- Current Assignee Address: US PA Philadelphia
- Agency: Baker & Hostetler LLP
- Main IPC: H01F38/00
- IPC: H01F38/00 ; C02F1/46 ; C02F1/48 ; C02F1/00 ; C02F1/461 ; C02F103/02

Abstract:
The invention is directed to apparatus for treating water by exposing the water to a pulsed plasma discharge. The pulsed plasma discharge is generated using a suitable electrode configuration to generate the plasma discharge in the fluid. Apparatus useful in the method may include a vessel, at least two electrodes for generating a plasma discharge in water, and a flow inlet and a flow outlet to allow water to be passed through the vessel. Also described is an in-line water treatment, where a pulsed plasma discharge is used in a pipe carrying moving water. Plasma based fluid treatment system may have many advantages in comparison to other treatment methods, such as very minimal maintenance, low operating power, and minimal pressure loss through the device.
Public/Granted literature
- US20150274554A1 FLUID TREATMENT USING PLASMA TECHNOLOGY Public/Granted day:2015-10-01
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