Invention Grant
US09354502B2 Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
有权
光刻设备，用于提供设定点数据的设备，设备制造方法，用于提供设定点数据的方法和计算机程序
- Patent Title: Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program
- Patent Title (中): 光刻设备，用于提供设定点数据的设备，设备制造方法，用于提供设定点数据的方法和计算机程序
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Application No.: US14360888Application Date: 2012-12-13
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Publication No.: US09354502B2Publication Date: 2016-05-31
- Inventor: Erik Roelof Loopstra , Martinus Hendricus Hoeks
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2012/075450 WO 20121213
- International Announcement: WO2013/104482 WO 20130718
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/54 ; G03B27/72 ; G03F7/20
Abstract:
An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid.
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