Invention Grant
- Patent Title: Density-based integrated circuit design adjustment
- Patent Title (中): 基于密度的集成电路设计调整
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Application No.: US13970281Application Date: 2013-08-19
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Publication No.: US09355201B2Publication Date: 2016-05-31
- Inventor: Yuri Granik
- Applicant: Mentor Graphics Corporation
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Agency: Klarquist Sparkman, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The disclosed technology is related to adjusting an integrated circuit design while accounting for a local density of the design. In particular exemplary embodiments, a local density value for a layout design that defines a plurality of geometric shapes is derived. Subsequently, one or more of the geometric shapes are adjusted such that the local density value is preserved. With some implementations, the local density value is preserved if the adjusted local density value is within a threshold amount of the derived local density value.
Public/Granted literature
- US09009643B2 Density-based integrated circuit design adjustment Public/Granted day:2015-04-14
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