Invention Grant
- Patent Title: Variable capacitance device
- Patent Title (中): 可变电容器件
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Application No.: US13452971Application Date: 2012-04-23
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Publication No.: US09355783B2Publication Date: 2016-05-31
- Inventor: Keiichi Umeda , Teruhisa Shibahara , Hiroshi Yamada
- Applicant: Keiichi Umeda , Teruhisa Shibahara , Hiroshi Yamada
- Applicant Address: JP Kyoto
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Keating & Bennett, LLP
- Priority: JP2009-258302 20091111
- Main IPC: H01G7/00
- IPC: H01G7/00 ; H01G5/00 ; H04R25/00 ; H01G5/18 ; H01G5/011

Abstract:
A variable capacitance device that operates properly at a point along a signal line through which a high-voltage RF signal passes while reducing a necessary DC voltage includes a substrate, a beam, and lower drive electrodes. The beam is connected to the substrate through a support portion. Lower drive electrodes and the beam generate a capacitance when a DC voltage is applied, and an electrostatic force due to this capacitance deforms the beam. The lower drive electrodes face the beam and are coupled to each other through the beam. An RF signal propagates between the lower drive electrodes.
Public/Granted literature
- US20120206857A1 VARIABLE CAPACITANCE DEVICE Public/Granted day:2012-08-16
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