Invention Grant
US09355958B2 Semiconductor device having a corrosion-resistant metallization and method for manufacturing thereof 有权
具有耐腐蚀性金属化的半导体装置及其制造方法

Semiconductor device having a corrosion-resistant metallization and method for manufacturing thereof
Abstract:
A semiconductor device includes a semiconductor substrate having a first side, a second side opposite the first side, an active area, an outer rim, and an edge termination area arranged between the outer rim and the active area. A metallization structure is arranged on the first side of the semiconductor substrate and comprising at least a first metal layer comprised of a first metallic material and a second metal layer comprised of a second metallic material, wherein the first metallic material is electrochemically more stable than the second metallic material. The first metal layer extends laterally further towards the outer rim than the second metal layer.
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