Invention Grant
- Patent Title: Semiconductor device having a corrosion-resistant metallization and method for manufacturing thereof
- Patent Title (中): 具有耐腐蚀性金属化的半导体装置及其制造方法
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Application No.: US14068398Application Date: 2013-10-31
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Publication No.: US09355958B2Publication Date: 2016-05-31
- Inventor: Carsten Schäffer , Oliver Humbel , Mathias Plappert , Angelika Koprowski
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/768 ; H01L29/40 ; H01L23/482

Abstract:
A semiconductor device includes a semiconductor substrate having a first side, a second side opposite the first side, an active area, an outer rim, and an edge termination area arranged between the outer rim and the active area. A metallization structure is arranged on the first side of the semiconductor substrate and comprising at least a first metal layer comprised of a first metallic material and a second metal layer comprised of a second metallic material, wherein the first metallic material is electrochemically more stable than the second metallic material. The first metal layer extends laterally further towards the outer rim than the second metal layer.
Public/Granted literature
- US20150115449A1 Semiconductor Device Having a Corrosion-Resistant Metallization and Method for Manufacturing Thereof Public/Granted day:2015-04-30
Information query
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