Invention Grant
- Patent Title: Resistive random access memory (RRAM) structure
- Patent Title (中): 电阻随机存取存储器(RRAM)结构
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Application No.: US14684642Application Date: 2015-04-13
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Publication No.: US09356072B2Publication Date: 2016-05-31
- Inventor: Chih-Yang Chang , Wen-Ting Chu , Kuo-Chi Tu , Yu-Wen Liao , Hsia-Wei Chen , Chin-Chieh Yang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L45/00

Abstract:
A resistive random access memory (RRAM) cell comprises a transistor having a gate and a source/drain region, a bottom electrode having an upper surface coplanar with a top surface of the gate, a resistive material layer on the bottom electrode, a top electrode on the resistive material layer, and a conductive material connecting the bottom electrode to the source/drain region.
Public/Granted literature
- US20150214276A1 RESISTIVE RANDOM ACCESS MEMORY (RRAM) STRUCTURE Public/Granted day:2015-07-30
Information query
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