Invention Grant
- Patent Title: Composition and method for polishing glass
- Patent Title (中): 抛光玻璃的组成和方法
-
Application No.: US13784330Application Date: 2013-03-04
-
Publication No.: US09358659B2Publication Date: 2016-06-07
- Inventor: Hon Wu Lau , Haresh Siriwardane
- Applicant: Cabot Microelectronics Corporation
- Applicant Address: US IL Aurora
- Assignee: Cabot Microelectronics Corporation
- Current Assignee: Cabot Microelectronics Corporation
- Current Assignee Address: US IL Aurora
- Agent Thomas Omholt; Arlene Homilla
- Main IPC: C09G1/02
- IPC: C09G1/02 ; B24B37/04 ; C08K3/36

Abstract:
The invention provides a chemical-mechanical polishing composition containing (a) abrasive particles, (b) a polymer, and (c) water, wherein (i) the polymer possesses an overall charge, (ii) the abrasive particles have a zeta potential Za measured in the absence of the polymer and the abrasive particles have a zeta potential Zb measured in the presence of the polymer, wherein the zeta potential Za is a numerical value that is the same sign as the overall charge of the polymer, and (iii) |zeta potential Zb|>|zeta potential Za|. The invention also provides a method of polishing a substrate with the polishing composition.
Public/Granted literature
- US20140248823A1 COMPOSITION AND METHOD FOR POLISHING GLASS Public/Granted day:2014-09-04
Information query