Invention Grant
US09358737B2 3D mold for manufacturing of sub-micron 3D structures using 2-D photon lithography and nanoimprinting and process thereof
有权
用于使用2-D光子光刻和纳米压印及其工艺制造亚微米3D结构的3D模具
- Patent Title: 3D mold for manufacturing of sub-micron 3D structures using 2-D photon lithography and nanoimprinting and process thereof
- Patent Title (中): 用于使用2-D光子光刻和纳米压印及其工艺制造亚微米3D结构的3D模具
-
Application No.: US12933803Application Date: 2009-11-23
-
Publication No.: US09358737B2Publication Date: 2016-06-07
- Inventor: Shyi-Herng Kan
- Applicant: Shyi-Herng Kan
- Applicant Address: SG Singapore
- Assignee: HELIOS APPLIED SYSTEMS PTE LTD
- Current Assignee: HELIOS APPLIED SYSTEMS PTE LTD
- Current Assignee Address: SG Singapore
- Agency: Nields, Lemack & Frame, LLC
- Priority: SG200809489-8 20081222
- International Application: PCT/SG2009/000443 WO 20091123
- International Announcement: WO2010/074659 WO 20100701
- Main IPC: G06F17/50
- IPC: G06F17/50 ; B29D11/00 ; B82Y10/00 ; B82Y40/00 ; G03F7/00 ; G03F7/20 ; G02B3/04 ; G02B3/12

Abstract:
A process to manufacture a 3D mold to fabricate a high-throughput and low cost sub-micron 3D structure product is disclosed. The process integrates use of 2-photon laser lithography and 3D write technology to make a 3D mold of each layer of the 3D structure product, and then use nanoimprinting to form a sheet of polymer film of each layer of the 3D structure from the said 3D mold of that layer. Each layer of the sheet of polymer film is then fabricated into the sub-micron 3D structure product. The 3D mold of each layer of a high-throughput and low cost sub-micron 3D structure product, is further used to make master molds which is then used to form a sheet of polymer film of each layer of the 3D structure to fabricate the sub-micron 3D structure product. Applications using this process are also disclosed.
Public/Granted literature
Information query