Invention Grant
- Patent Title: Plasma treatment to strengthen diamonds
- Patent Title (中): 等离子处理加强钻石
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Application No.: US13915385Application Date: 2013-06-11
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Publication No.: US09359213B2Publication Date: 2016-06-07
- Inventor: Zhiyong Wang , William Wang
- Applicant: The Board of Regents of the Nevada System of Higher Education on Behalf of The University of Las Vegas
- Applicant Address: US NV Las Vegas
- Assignee: The Board of Regents of the Nevada System of Higher Education on Behalf of the University of Nevada, Las Vegas
- Current Assignee: The Board of Regents of the Nevada System of Higher Education on Behalf of the University of Nevada, Las Vegas
- Current Assignee Address: US NV Las Vegas
- Agency: Ballard Spahr LLP
- Main IPC: C01B31/06
- IPC: C01B31/06 ; C01B31/00

Abstract:
The physical properties of a diamond are altered by: applying a cationic elemental plasma to a diamond at a plasma temperature of less than 300° C.; allowing the cationic plasma to chemically bond with atoms in defects within the diamond; and removing the plasma from the diamond. The cationic elemental plasma may exemplary be selected from the group consisting of as H+, Na+, Li+ and K+. It is preferred that no plasma is projected from a source at the diamond and that the plasma is provided as an environment surrounding the diamond.
Public/Granted literature
- US20130330265A1 Plasma Treatment to Strengthen Diamonds Public/Granted day:2013-12-12
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