Invention Grant
- Patent Title: Separation of alpha emitting species from plating baths
- Patent Title (中): 从电镀浴中分离α发射物质
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Application No.: US14950720Application Date: 2015-11-24
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Publication No.: US09359687B1Publication Date: 2016-06-07
- Inventor: Charles L. Arvin , Michael S. Gordon
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Matthew C. Zehrer
- Main IPC: C25D3/30
- IPC: C25D3/30 ; C25D5/18 ; C25D21/06 ; C25D5/02 ; C25D21/10 ; C25D21/14 ; C25D7/12

Abstract:
A non alpha controlled Tin including Tin and a trace amount of Polonium is utilized as a plating anode to selectively plate Tin upon a plating cathode. Tin may be selectively plated by pulse plating the non alpha controlled Tin with current control to suppress plating of Polonium upon the plating cathode. Tin may also be selectively plated by pulse plating the non alpha controlled Tin with potential control to suppress plating of Polonium upon the plating cathode. Tin may also be selectively plated by pulse and reverse plating to plate out Polonium upon a filtering cathode. Tin may also be selectively plated by plating out Polonium upon a filtering cathode within a concentrate. Tin may also be selectively plated by plating out purified Tin upon a filtering cathode, separating the purified Tin from the filtering cathode, and utilizing the purified Tin to plate Tin upon the plating cathode.
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