Invention Grant
- Patent Title: System and method for correcting the focus of a laser beam
- Patent Title (中): 用于校正激光束焦点的系统和方法
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Application No.: US14085664Application Date: 2013-11-20
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Publication No.: US09360600B2Publication Date: 2016-06-07
- Inventor: Christopher Paul Pate , Jason Michael Arcand
- Applicant: Cymer, LLC
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Card & Kaslow LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G02B5/08 ; G02B27/40 ; G02B7/18 ; G02B26/08

Abstract:
Focus of a laser optical system can be corrected using a variable radius mirror having a focusing cavity and a separate cooling cavity. Pressure of a focusing material at a sufficiently low mass flow in the focusing cavity deforms a reflective surface mounted to the focusing cavity, changing its radius. Cooling material provided to the cooling cavity cools the variable radius mirror. A laser beam is reflected by the deformed reflecting surface to focusing optics, focusing the reflected laser beam on an EUV-emitting target, and minimizing a laser focus error by one or more of: maximizing a measured EUV power or minimizing a measured laser beam divergence. Providing focusing material at a deformation pressure and at a sufficiently low mass flow, and providing a separate cooling cavity, avoids perturbations in the reflective surface which would otherwise affect laser beam focus.
Public/Granted literature
- US20150137011A1 System and Method for Correcting the Focus of a Laser Beam Public/Granted day:2015-05-21
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