- Patent Title: On-chip diffraction grating prepared by crystallographic wet-etch
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Application No.: US14635912Application Date: 2015-03-02
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Publication No.: US09360601B2Publication Date: 2016-06-07
- Inventor: Yun-Chung Na , John Heck , Haisheng Rong
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Patent Capital Group
- Main IPC: B44C1/22
- IPC: B44C1/22 ; G02B5/18 ; G02B6/02
Abstract:
Methods of forming microelectronic structures are described. Embodiments of those methods may include forming a photomask on a (110) silicon wafer substrate, wherein the photomask comprises a periodic array of parallelogram openings, and then performing a timed wet etch on the (110) silicon wafer substrate to form a diffraction grating structure that is etched into the (110) silicon wafer substrate.
Public/Granted literature
- US20150185377A1 ON-CHIP DIFFRACTION GRATING PREPARED BY CRYSTALLOGRAPHIC WET-ETCH Public/Granted day:2015-07-02
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