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US09360754B2 Resin and photoresist composition comprising the same 有权
树脂和包含其的光致抗蚀剂组合物

Resin and photoresist composition comprising the same
Abstract:
The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
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