Invention Grant
- Patent Title: Resin and photoresist composition comprising the same
- Patent Title (中): 树脂和包含其的光致抗蚀剂组合物
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Application No.: US13290618Application Date: 2011-11-07
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Publication No.: US09360754B2Publication Date: 2016-06-07
- Inventor: Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
- Applicant: Koji Ichikawa , Masahiko Shimada , Takashi Nishimura , Akira Kamabuchi , Hyungjoo Kim , Mitsuyoshi Ochiai
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2010-250556 20101109; JP2010-250558 20101109
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F28/06 ; C08F20/58 ; C07D327/04 ; G03F7/039 ; G03F7/20

Abstract:
The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
Public/Granted literature
- US20120122034A1 RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME Public/Granted day:2012-05-17
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