Invention Grant
US09360756B2 Composition for forming fine resist pattern and pattern formation method using same
有权
用于形成精细抗蚀剂图案的组合物和使用其的图案形成方法
- Patent Title: Composition for forming fine resist pattern and pattern formation method using same
- Patent Title (中): 用于形成精细抗蚀剂图案的组合物和使用其的图案形成方法
-
Application No.: US14431512Application Date: 2013-10-01
-
Publication No.: US09360756B2Publication Date: 2016-06-07
- Inventor: Kazuma Yamamoto , Masahiro Ishii , Takashi Sekito , Hiroshi Yanagita , Shigemasa Nakasugi , Go Noya
- Applicant: Kazuma Yamamoto , Masahiro Ishii , Takashi Sekito , Hiroshi Yanagita , Shigemasa Nakasugi , Go Noya
- Applicant Address: LU Luxembourg
- Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Current Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
- Current Assignee Address: LU Luxembourg
- Agent Mitchell Brustein
- Priority: JP2012-219657 20121001
- International Application: PCT/JP2013/076635 WO 20131001
- International Announcement: WO2014/054606 WO 20140410
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/16 ; G03F7/32 ; G03F7/26 ; C08F220/26 ; C08F220/30 ; H01L21/027 ; H01L21/033 ; C08F12/24 ; C08F20/30 ; G03F7/039 ; G03F7/40 ; C09D129/02 ; C09D133/14 ; C09D137/00 ; G03F7/038
Abstract:
The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages.
Public/Granted literature
- US20150253669A1 COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION METHOD USING SAME Public/Granted day:2015-09-10
Information query
IPC分类:
