Invention Grant
- Patent Title: Photoresist stripping composition for manufacturing LCD
- Patent Title (中): 用于制造LCD的光阻剥离组合物
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Application No.: US13993278Application Date: 2010-08-19
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Publication No.: US09360761B2Publication Date: 2016-06-07
- Inventor: Ho Sung Choi
- Applicant: Ho Sung Choi
- Applicant Address: KR Anyang, Gyeonggi-do
- Assignee: LTC Co., Ltd.
- Current Assignee: LTC Co., Ltd.
- Current Assignee Address: KR Anyang, Gyeonggi-do
- Agency: Mintz Levin Cohn Ferris Glovsky and Popeo, P.C.
- Agent Kongsik Kim; Joohee Lee
- Priority: KR10-2009-0078867 20090825
- International Application: PCT/KR2010/005494 WO 20100819
- International Announcement: WO2011/025180 WO 20110303
- Main IPC: G03F7/42
- IPC: G03F7/42 ; C11D11/00
Abstract:
The present invention relates to a photoresist stripping composition for all process of manufacturing LCD, more specifically to a water-borne united photoresist stripping composition, as a weak basic composite comprising a tertiary alkanolamine, water, and an organic solvent. The composition according to the present invention prevents a corrosion of Al and Cu metal wiring in process of manufacturing LCD, has a good capability of removing photoresist, and is applied to all Al process, Cu process, an organic film process, and COA process.
Public/Granted literature
- US20130345106A1 PHOTORESIST STRIPING COMPOSITIONS FOR MANUFACTURING LCD Public/Granted day:2013-12-26
Information query
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