Invention Grant
- Patent Title: Illumination system, lithographic apparatus and method
- Patent Title (中): 照明系统,光刻设备及方法
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Application No.: US13361397Application Date: 2012-01-30
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Publication No.: US09360762B2Publication Date: 2016-06-07
- Inventor: Andrey Sergeevich Tychkov
- Applicant: Andrey Sergeevich Tychkov
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03F7/20

Abstract:
An illumination system comprising an array of controllable mirrors configured to direct radiation towards a pupil plane and an array of lenses configured to direct radiation sub-beams towards the array of controllable mirrors, wherein a first lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a first optical channel having a first optical power and a second lens of the array of lenses and a controllable mirror of the array of controllable mirrors forms a second optical channel having a second optical power, such that a radiation sub-beam formed by the first optical channel has a first cross-sectional area and shape at the pupil plane and a radiation sub-beam formed by the second optical channel has a second different cross-sectional area and/or shape at the pupil plane.
Public/Granted literature
- US20120194794A1 Illumination System, Lithographic Apparatus and Method Public/Granted day:2012-08-02
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