Invention Grant
US09362081B2 Source of X-rays generating a beam of nanometric size and imaging device comprising at least one such source
有权
产生纳米尺寸光束的X射线源和包括至少一个这样的源的成像装置
- Patent Title: Source of X-rays generating a beam of nanometric size and imaging device comprising at least one such source
- Patent Title (中): 产生纳米尺寸光束的X射线源和包括至少一个这样的源的成像装置
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Application No.: US14021367Application Date: 2013-09-09
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Publication No.: US09362081B2Publication Date: 2016-06-07
- Inventor: Pierre Bleuet , Nicolas Martin
- Applicant: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT
- Applicant Address: FR Paris
- Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee: Commissariat a l'energie atomique et aux energies alternatives
- Current Assignee Address: FR Paris
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: FR1258446 20120910
- Main IPC: H01J35/08
- IPC: H01J35/08 ; H01J35/04 ; G21K7/00 ; G01N23/04
Abstract:
A source of X-rays, and imaging device, and an imaging process are provided, including a source of electrons generating an electron beam of nanometric size and a target, the target being designed to send out an X-ray beam upon illumination by the electron beam, the target including one nanowire, for example made of silicon, and a nanowire catalyst, for example made of gold, covering the free end of the nanowire.
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