Invention Grant
US09362157B2 Method of processing substrate holder material as well as substrate holder processed by such method
有权
通过这种方法处理衬底保持器材料以及衬底保持器的方法
- Patent Title: Method of processing substrate holder material as well as substrate holder processed by such method
- Patent Title (中): 通过这种方法处理衬底保持器材料以及衬底保持器的方法
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Application No.: US13365665Application Date: 2012-02-03
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Publication No.: US09362157B2Publication Date: 2016-06-07
- Inventor: Marcus Gerardus Van Munster , Wilhelmus Johannes Mattheus Van Velzen , Johannes Leonardus Lamberdina Van Der Heijden
- Applicant: Marcus Gerardus Van Munster , Wilhelmus Johannes Mattheus Van Velzen , Johannes Leonardus Lamberdina Van Der Heijden
- Applicant Address: NL Helmond
- Assignee: XYCARB CERAMICS B.V.
- Current Assignee: XYCARB CERAMICS B.V.
- Current Assignee Address: NL Helmond
- Agency: Haynes and Boone, LLP
- Priority: NL2006146 20110204
- Main IPC: G01R31/26
- IPC: G01R31/26 ; H01L21/687 ; C23C16/458 ; C30B25/12 ; H01L21/66
Abstract:
A method is provided of processing substrate holder material for a substrate holder on which on a first side of said substrate holder a semiconductor substrate is to be placed for layered deposition of various semiconductor materials on the semiconductor substrate using induction heating. The method includes the operations of determining a first electrical resistivity at at least one measuring position on said substrate holder material, comparing said first electrical resistivity with a second reference electrical resistivity and adapting said substrate holder material in correspondence with said comparison. Also a substrate holder is provided which is processes by such a method.
Public/Granted literature
- US20120199063A1 METHOD OF PROCESSING SUBSTRATE HOLDER MATERIAL AS WELL AS SUBSTRATE HOLDER PROCESSED BY SUCH METHOD Public/Granted day:2012-08-09
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