Invention Grant
- Patent Title: Non-volatile memory device and method for manufacturing same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US14150193Application Date: 2014-01-08
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Publication No.: US09362168B2Publication Date: 2016-06-07
- Inventor: Toshiharu Tanaka
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: G11C5/06
- IPC: G11C5/06 ; H01L21/768 ; H01L27/06 ; H01L27/105

Abstract:
According to an embodiment, a non-volatile memory device includes a first wiring provided on an underlayer, a first memory cell array provided on the first wiring and including a plurality of memory cells, a first select element including a first control electrode provided between the first wiring and the first memory cell array. The device also includes a second wiring provided at the same level as the first wiring and electrically connected to the first control electrode, and a first plug electrically connecting the first control electrode and the second wiring, one end of the first plug being in contact with the second wiring, and a side surface of the first plug being in contact with the first control electrode.
Public/Granted literature
- US20150062993A1 NON-VOLATILE MEMORY DEVICE AND METHOD FOR MANUFACTURING SAME Public/Granted day:2015-03-05
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