Invention Grant
- Patent Title: Semiconductor device, method for manufacturing the same, circuit substrate, electro-optical apparatus, and electronic equipment
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Application No.: US14740603Application Date: 2015-06-16
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Publication No.: US09362246B2Publication Date: 2016-06-07
- Inventor: Haruki Ito
- Applicant: Seiko Epson Corporation
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2002-350337 20021202
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01L23/485 ; H01L21/48 ; G02F1/1345

Abstract:
A semiconductor device is provided with a plurality of protrusions which are made of a resin and which protrude higher than electrodes, and conductive layers which are electrically connected to the electrodes and which cover the top surfaces of the protrusions. A method for manufacturing the semiconductor device includes a step of applying a layer of the resin to the semiconductor device except for the electrodes, a step of patterning the conductive layers on the electrodes and the layer of the resin in accordance with the protrusions, and a step of removing the layer of the resin located between the conductive layers by the use of the patterned conductive layers as masks so as to form the protrusions.
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Information query
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